Academic Papers

Thin Films, Plasma...

Plasma Etching

Plasma Etching

Dependence of SiO2 etch rate on sidewall angle as affected by bottom materials in a high-density CHF3 plasma. 270.67 KB 31 downloads

Dependence of SiO2 etch rate on sidewall angle as affected by bottom materials in...

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Control of surface reactions in high-performance SiO2 etching. 759.40 KB 36 downloads

Control of surface reactions in high-performance SiO2 etching. ...

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C4F8 dissociation in an inductively coupled plasma. 432.99 KB 31 downloads

C4F8 dissociation in an inductively coupled plasma. ...

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Others

Plasma Etching

Dependence of SiO2 etch rate on sidewall angle as affected by bottom materials in a high-density CHF3 plasma. 270.67 KB 31 downloads

Control of surface reactions in high-performance SiO2 etching. 759.40 KB 36 downloads

C4F8 dissociation in an inductively coupled plasma. 432.99 KB 31 downloads

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