Plasma Etching
Etch characteristics of maskless Oxide/Nitride/Oxide/Nitride (ONON) stacked structure using C4H2F6-based gas 981.04 KB 5 downloads
Etch characteristics of maskless Oxide/Nitride/Oxide/Nitride (ONON) stacked structure...Surface sulfurization of amorphous carbon films in the chemistry of oxygen plasma added with SO2 or OCS for high-aspect-ratio etching 2.90 MB 0 downloads
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