UHV-TPD with Hiden Analytical
Hiden Analytical’s complete experimental UHV-TPD Workstation is equipped with a multiport UHV sample chamber and a heated sample stage of up to 1000 °C with integrated PID controls. This hardware is equipped with a high precision triple filter analyser, for time/temperature-resolved analysis of desorbed species with unmatched sensitivity. This equipment has proven successful in numerous areas of product and technology research and development, including:
- Thin films;
- Materials characterisation;
- H2/D2/T2 characterisation in fusion reactor wall tiles;
- Surface science.
The UHV-TPD workstation is primarily geared towards the study of novel semiconductor manufacturing, providing actionable data regarding the adsorbed species on thin films. This is valuable for diagnosing performance issues and potential sources of contamination in the production chain.
With a real-time 3D bar view, unknown elements can be rapidly and easily identified against the mass spectrometer’s built-in mass spectral library.
UHV-TPD studies are also focused on the outgassing properties of high performance materials used in extreme environments, with fully-automated temperature control and analysis enabling high-throughput TPD measurements of coated silicon surfaces.
UHV-TPD Workstation from Hiden Analytical
Hiden Analytical has been developing, manufacturing, and supplying cutting-edge quadrupole mass spectrometers for some of the most advanced forms of material analysis currently performed. Our UHV-TPD workstation provides a unique solution for advanced electronics manufacturing and research and development into novel energy storage materials.