Plasma Deposition: Magnetron Sputtering
Analytical systems for plasma deposition
Hiden Analytical plasma analysis systems give unparalleled insight into magnetron sputtering and other plasma deposition processes.
Related Products
The term ‘plasma deposition’ encompasses various vapor deposition techniques that make use of plasma to deposit a ‘source’ material onto a substrate. Such techniques are commonly used to enhance surface properties such as hardness, chemical resistance, and adhesion; or to impart specific optical or electronic properties.
Magnetron Sputtering
Magnetron sputtering is a deposition technique in which a plasma (typically an inert gas such as argon) is magnetically confined around a ‘target’ of source material deposited onto a substrate. High energy ions in the plasma erode the target, liberating atoms from its surface. Liberated atoms, which are electrically neutral and able to escape the magnetic field, are then deposited onto the substrate, forming a thin film.
Typical magnetron sputtering processes are performed in a high vacuum environment to minimize contaminants’ presence. Confining the plasma around the target using strong magnetic fields enables more ionizing collisions between plasma electrons and gaseous neutrals near the target’s surface, increasing plasma density and producing a higher deposition rate. Also, the confinement of electrons in the plasma prevents damage caused by these electrons’ direct impact with the substrate or growing film.
Wear-resistant coatings, corrosion-resistant films, dry film lubricants, and optical and decorative films are among the typical DC magnetron sputtering applications.
Analytical Tools for Magnetron Sputtering Applications
The development of effective magnetron sputtering processes relies on accurately measuring plasma parameters like composition, density and ion energy. The Hiden EQP mass spectrometer is optimized for plasma analysis, making it the ideal tool for correlating plasma conditions in magnetron deposition processes with the properties of the resultant films achieved.
Hiden Analytical produces a range of specialized tools for plasma characterization. To find out more information about our industry-leading products, get in touch with Hiden Analytical today.
Atmospheric Plasma Analysis by Molecular Beam MS – GEC 2004 (1.38 MB)
Atmospheric Pressure Plasma Analysis by Modulated Molecular Beam MS – ICPIG 2005 (256 KB)
Ion Energy Distributions for a DC Plasma – GEC 2003 (250 KB)
Mass Analysis of CF3I Decomposition in a Surface Barrier Discharge – GEC 2011 (2.8 MB)
Mass Spectroscopy of Metastable Species during Plasma Processing – GEC 2011 (2.1 MB)
Time Resolved Ionisation Studies of HIPIMS – PSE 2006 (848 KB)
Cutting tools hardening and sharpening by fast argon and nitrogen 734.65 KB 19 downloads
Cutting tools hardening and sharpening by fast argon and nitrogen ...Study on the mechanism for the deposition of a porous zinc thin film by using a modified DC magnetron sputtering system 20.32 MB 20 downloads
Study on the mechanism for the deposition of a porous zinc thin film by using...Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth 5.13 MB 18 downloads
Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and...Sputter Deposited Metal Layers Embedded in Composites—From Fundamentals to Applications 24.43 MB 20 downloads
Sputter Deposited Metal Layers Embedded in Composites—From Fundamentals to Applications ...Time Resolved Langmuir Probe Diagnostics of High Power Pulsed DC Magentron Discharge... 1,018.48 KB 91 downloads
Time resolved Langmuir probe diagnostics of high power pulsed DC magentron discharge...Studies of Film Deposition in Fluorocarbon Plasmas Employing a Small Gap Structure 326.63 KB 39 downloads
Studies of film deposition in fluorocarbon plasmas employing a small gap structure. ...Quadrupole Mass Spectrometry and Time-of-Flight Analysis of Ions Resulting from 532 nm Pulsed... 414.94 KB 54 downloads
Quadrupole mass spectrometry and time-of-flight analysis of ions resulting from 532...Plasma Dynamic in Chromium and Titanium HIPIMS Discharges 401.78 KB 34 downloads
Plasma dynamic in chromium and titanium HIPIMS discharges. ...Physics of High Power Impulse Magnetron Sputtering 409.42 KB 31 downloads
Physics of High Power Impulse Magnetron Sputtering. ...Organic Films Prepared by Polymer Sputtering 374.86 KB 53 downloads
Organic films prepared by polymer sputtering. ...- Vlček, J. et al. Magnetron sputtered Si–B–C–N films with high oxidation resistance and thermal stability in air at temperatures above 1500 °C. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 26, 1101–1108 (2008).
- Vlček, J. et al. Reactive magnetron sputtering of hard Si–B–C–N films with a high-temperature oxidation resistance. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 23, 1513–1522 (2005).
- Ehiasarian, A. P. et al. Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films. Journal of Applied Physics 109, 104314 (2011).