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Plasma Etching

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In Situ Characterization of Residues Formed on a Plasma-Etching Chamber 279.87 KB 13 downloads

In situ characterization of residues formed on a plasma-etching chamber. ...
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Identification of volatile products in low pressure hydrocarbon electron resonance reactive ion etching of InP and GaAs. 566.31 KB 10 downloads

Identification of volatile products in low pressure hydrocarbon electron resonance...
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Highly anisotropic gate electrode patterning in neutral beam etching using F2 gas chemistry. 236.40 KB 14 downloads

Highly anisotropic gate electrode patterning in neutral beam etching using F2 gas...
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High density plasma etching of low k dielectric polymers in oxygen-based chemistries. 360.22 KB 11 downloads

High density plasma etching of low k dielectric polymers in oxygen-based chemistries. ...
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Generating high-efficiency neutral beams by using negative ions in an inductively coupled plasma source. 757.83 KB 12 downloads

Generating high-efficiency neutral beams by using negative ions in an inductively...
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Evaluation of silicon oxide cleaning using F2/Ar remote plasma processing. 187.08 KB 11 downloads

Evaluation of silicon oxide cleaning using F2/Ar remote plasma processing. ...
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Dry etching of (Pb,Sr) TiO3 thin films using inductively coupled plasma. 149.55 KB 14 downloads

Dry etching of (Pb,Sr) TiO3 thin films using inductively coupled plasma. ...
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Dry etching of (Ba,Sr)TiO3 thin films using an inductively coupled plasma. 155.95 KB 11 downloads

Dry etching of (Ba,Sr)TiO3 thin films using an inductively coupled plasma. ...
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Dependence of SiO2 etch rate on sidewall angle as affected by bottom materials in a high-density CHF3 plasma. 270.67 KB 15 downloads

Dependence of SiO2 etch rate on sidewall angle as affected by bottom materials in...
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Control of surface reactions in high-performance SiO2 etching. 759.40 KB 17 downloads

Control of surface reactions in high-performance SiO2 etching. ...