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Plasma Etching

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Selective Etching of (Ba,Sr)TiO3 Thin Films Over Silicon in an Inductively Coupled Plasma
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Selective etching of (Ba,Sr)TiO3 thin films over silicon in an inductively coupled...
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Quantitative Control of Etching Reactions on Various SiOCH Materials
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Quantitative control of etching reactions on various SiOCH materials. ...
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Plasma Etching Selectivity of ZrO2 to Si in BCl3/Cl2 Plasmas
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Plasma etching selectivity of ZrO2 to Si in BCl3/Cl2 plasmas. ...
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Plasma Etching of High Dielectric Constant Materials on Silicon in Halogen Chemistries
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Plasma etching of high dielectric constant materials on silicon in halogen chemistries. ...
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Measurements of Neutral and Ion Composition, Neutral Temperature, and Electron Energy...
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Measurements of neutral and ion composition, neutral temperature, and electron energy...
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Magnetized inductively coupled plasma etching of GaN in Cl2/BCl3 plasmas.
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Mass spectrometry studies of resist trimming processes in HBr/O2 and Cl2/O2chemistries. ...
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Magnetized Inductively Coupled Plasma Etching of GaN in Cl2/BCl3 Plasmas
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Magnetized inductively coupled plasma etching of GaN in Cl2/BCl3 plasmas. ...
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Ion-Enhanced Chemical Etching of HfO2 for Integration in Metal–Oxide–Semiconductor Field...
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Ion-enhanced chemical etching of HfO2 for integration in metal–oxide–semiconductor...
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Ion Energy Distributions and Optical Emission Spectra in NF3-Based Process Chamber...
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Ion energy distributions and optical emission spectra in NF3-based process chamber...
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Investigation of the Outgassing Characteristics of the Materials Comprising a Plasma...
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Investigation of the outgassing characteristics of the materials comprising a plasma...