Electronic materials
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Ion implantation and diffusion is used to deliver dopants into semiconductors, SIMS accurately measures the dopant concentration for process development and monitoring.
The examples below show quantified depth profiles in silicon substrates
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Combustion Synthesis of Triangular and Multifunctional ZnON (x # 0.15) Materials. 1.36 MB 35 downloads
Combustion Synthesis of Triangular and Multifunctional ZnON (x # 0.15) Materials. ...
Characterization of TiO2 coatings prepared by a modified electric arc-physical vapour deposition system. 1.03 MB 40 downloads
Characterization of TiO2 coatings prepared by a modified electric arc-physical vapour...
